Research
Communication & Signal Processing
Inverse Lithography
Gonzalo Arce
- Multi-layered schemes in MIMO systems
- OFDM for Cooperative Networks
- Radar Imaging
- 50% Efficient Solar Cells
- Capacity optimization
- Channel coding for non-standard channels with memory
- Exploiting Diversity in Wireless Networks
- Image Compression
- Low-density generator matrix codes
- Message Authentication in Noisy Environments
- Multi-tone blue noise dithering
- Inverse Lithography
- Space-time/frequency coding for MIMO and cooperative communications systems
- Steganalysis of Digital Images and Videos
- Turbo-like codes for distributed source and joint source-channel coding
- Compressive sensing in imaging, sensor networks, and UWB radios
- Lossless Data Compression
Current funding
Intel
Group Staff
Graduate Student
Xu Ma
Collaborators
Dennis Prather (University of Delaware)
Christof Krautschik (Intel)
Similar to photographic printing, optical lithography uses light to expose masks which include transparent and opaque regions. The transmitted energy creates patterns on the underneath wafer. Due to resolution limits of optical lithographic systems, the resolution enhancement techniques (RET) are applied to compensate and minimize the pattern distortions as they are projected onto semiconductor wafers. RET mainly includes three kinds of techniques: optical proximity correction (OPC), phase-shifting masks (PSM), and off-axis illumination (OAI). Inverse lithography research at University of Delaware aims at developing gradient-based RET optimization methods to design mask patterns which effectively reduce the pattern distortions on the wafer. We are also studying double exposure optimization methods, in which the wafers are exposed twice with different optimized mask patterns.
Recent publications
Xu Ma and Gonzalo R. Arce, "Generalized Inverse Lithography Methods for Phase-Shifting Mask Design," Optics Express, Vol. 15, Issue 23, pp. 15066-15079, 2007.
Xu Ma and Gonzalo R. Arce, "Generalized Inverse Lithography Methods for Phase-Shifting Mask Design," in Proceedings of SPIE, vol. 65200U, San Jose, CA, March, 2007.
