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Nanofabrication Facility
Capabilities & Equipment > Characterization Systems
Horiba Jobin Yvon UVISEL Visible-NIR Spectroscopic Ellipsometer
A photo of the Horiba Jobin Yvon UVISEL.
Spectroscopic Ellipsometry is a very powerful and sensitive non-destructive optical measurement technique for determining the thickness and optical properties of materials. Typically used for thin film measurements, our spectroscopic ellipsometer is capable of characterizing films across a broad spectral range from 260nm to 1700nm. This particular model of ellipsometer uses a phase modulated detection system which provides excellent accuracy and precision and signal-to-noise ratio. In addition to its excellent measurement capabilities, the spectroscopic ellipsometer also includes the powerful yet user-friendly modeling software for easy interpretation of measurement data.
Measurement range includes 260nm to 1700nm (0.75eV to 4.7eV)
Fully automated data collection with speeds as fast as 1ms per data point
Automatic XY translation stage capable of handling up to 6-inch wafers allows for multiple measurements across the surface of a sample
3 adjustable spot sizes for incident light – 50µm, 100µm, and 1mm
Imaging camera for sample viewing
Capable of measuring single films or complex multilayer stacks
A graph illustrating the change in the imaginary part of the dielectric constant for ultra thin layers of amorphous silicon determined using our spectroscopic ellipsometer.
Great for measuring and modeling material properties such as:
- film thickness and uniformity
- refractive index and extinction coefficient
- composition/crystallinity
- microstructure
