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Nanofabrication Facility
Capabilities & Equipment > Deposition Systems
AG Associates Heat Pulse 210T Rapid Thermal Processor (RTP)
AG Associates Heat Pulse 210T Rapid Thermal Processor
Silicon solar cells fabricated by planar processing techniques. c) deposited multilayer metal contacts sintered in a rapid thermal processor.
The RTP a.k.a. rapid thermal annealer (RTA) is commonly used to anneal metal contacts onto semiconductor devices. Temperatures between 200-1200oC can be reached at rates of 0.1-250oC/s with an accuracy of ±3oC. The unit can accommodate one three inch wafer or smaller.
Gasses currently connected are:
- Argon
- Nitrogen
- Nitrogen with 4% Hydrogen
- Oxygen
