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Nanofabrication Facility
Capabilities & Equipment > Deposition Systems
CHA SE 1000RAP Electron Beam (E-beam) Evaporator
CHA SE 1000RAP Electron Beam Evaporator
Silicon solar cells fabricated by planar processing techniques. c) multilayer metal contacts deposited with electron beam evaporator.
The E-beam evaporator is used to deposit metals and dielectrics in thicknesses from angstroms to microns. It is equipped with four 7cc pockets and two 15 cc pockets and a 10 kW SR-10 power supply for evaporation. The system pumps down to 1 X 10-7 Torr with the combination of a Leybold Trivac rotary vane pump and a CTI-10 cryogenic pump.
Deposition thickness is sensed with quartz crystal monitor. An Infinicon IC/4Plus unit allows for automated deposition control. The system is equipped with a shutter to cover the source material until desired deposition rate is achieved.
Current sources include:
- Aluminum
- Silver
- Titanium
- Palladium
- Germanium
- Gold
- Magnesium fluoride
- Nickel
A total of 28 four inch wafers or custom holders fabricated for different shapes and sizes can be accommodated in the planetary.
