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Nanofabrication Facility
Capabilities & Equipment > Deposition Systems
Edwards E-Beam Evaporator Auto 306
A photo of the Edwards E-Beam Evaporator Auto 306 PECVD PD-220N
An SEM image of a Ti/Au electrode deposited on a GaAs/AlGaAs waveguide
Our E-Beam Evaporator system is an Edwards Auto 306 model. The Auto 306 is used primarily for the evaporation of thin metal films for device contacts or etch masks. The model includes a four hearth system, capable of depositing up to four separate materials without venting the chamber. Target crucibles are easily interchanged between evaporations and inactive crucibles are hidden to avoid contamination. The electron beam can be swept over the surface of the target with separate frequency controls in the x and y dimension for uniform evaporation. The sample chuck has rotational capabilities to minimize shadowing effects. The system is very easy to use with a computerized interface to monitor the vacuum pressure and a crystal sensor calibrated to monitor the deposition rate of various materials.
3kW free standing power supply module
270? electron beam deflection minimizes filament contamination
Available target materials include
- Titanium
- Gold
- Chrome
- Gold Germanium
- Aluminum
- Silicon
- Nickel
- Palladium
