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Nanofabrication Facility
Capabilities & Equipment > Deposition Systems
Denton Vacuum Discovery 18 Deposition System
Denton Vacuum Discovery 18 Deposition System
SEM images of thick and thin Pd sputtered films on SiO2 cantilevers. Important aspects are the Pd profile in trenched sub-micron spaced structures, minimal Pd scattering under the cantilevers, and the film microstructure.
The Denton Vacuum Discovery 18 Deposition System is designed for thin film production and research. Multiple source deposition is accomplished with this system, using two sputter sources and the ability to heat, apply RF bias, and rotate the substrate.
The source size is 3” dia., and wafer sizes up to 3” can be accommodated. Argon can be employed as a process gas. Energy levels are up to 300 W for DC and 600 W for RF. Vacuum of 2E10-8 is achievable by means of an Alcatel rotary vane mechanical roughing pump and an Alcatel TMP-151 turbomolecular pump.
