Research Centers & Facilities
Return to Research Overview
Nanofabrication Facility
Capabilities & Equipment > Lithography
ABM UV/DUV Mask Aligner
Photo of the ABM UV/DUV mask aligner
Lithography results obtained using this mask aligner.
Our mask aligner is made by ABM, Inc. This is a semi-automatic contact lithography system designed for research and R&D purpose. This tool is capable of uniform exposure over 4” wafer surface. The features include:
- Switchable 365-nm, 254-nm and 220-nm UV and Deep-UV sources
- Automatic exposure timer and shutter
- Two sets of mask-plate mounting hardware accommodating different sizes of masks from 2” to 5”
- Two sets of sample chucks for arbitrary sample size from <1 cm up to 3”
- IR backside alignment capability
- Display for manual alignment
- Available resist recipes include:
- Az5214E image reversal process for lift-off
- NR7-1500py negative resist
- SU8 thick resist process (>30µm)
- Az4620 gray scale lithography
