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Nanofabrication Facility
Capabilities & Equipment > Lithography
Karl Suss MJB-3 Mask Aligner
Karl Suss MJB-3 HP/350W Mask Aligner
The Karl Suss MJB-3 HP/350W Mask Aligner is designed for high resolution photolithography. It accommodates 3” wafers and offers flexibility in handling irregularly shaped substrates up to 3” in diameter. A 350 W mercury short-arc lamp and optical system, including diffraction optics, provides for 0.6 micron resolution. Constant intensity wavelengths are 365 and 405 nm. A Suss Normalfield M400 microscope is used for alignment, and one of our MJB-3 units is equipped with a scanning IR viewing system for backside alignment and includes video camera and monitor.
