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Nanofabrication Facility
Capabilities & Equipment > Lithography
Headway PWM32 Photo Resist Spinner
Headway PWM32 Photo Resist Spinner
Headway PWM32 Photo Resist Spinner system.
The Headway PWM32 Spinner is used to coat substrates with photo resist. It includes an 8” diameter bowl with splash deflectors and a series of vacuum chucks from ½” to 4”. The adjustable spinning speed varies from 50 to 10,000 RPM. The sequence controller supports up to 10 user-designed recipes, each with up to 9 steps for speed, ramp and dwell.
