Nanofabrication Facility

Capabilities & Equipment

Lithography

Photolithography

• Headway PWM32 Photo Resist Spinner
• The Headway PWM32 Spinner for coating substrates with photo resist has adjustable speed and supports user designed recipes.

• Karl Suss MJB-3 Mask Aligner
• The Karl Suss MJB-3 HP/350W Mask Aligner for high resolution (0.6 micron) photolithography provides exposures at 365 and 405 nm wavelength.

• ABM Mask Aligner
• The UV/deep UV mask aligner from ABM, Inc. provides filters for ultra high resolution lithography at 365nm, 254nm, or 220nm wavelength.

Electron-Beam Lithography/Microscopy Systems

• Raith50 SEM & Ebeam
• Electron-beam lithography system (and SEM) for high-resolution (70nm) lithography and imaging characterization.

• Raith e_LiNE Electron-beam Lithography and Nanoengineering Workstation
• The Raith e_LiNE system is an ultra high resolution electron beam lithography system and nanoengineering workstation.

 

Capabilities & Equipment

• Etching
• Lithography
  • Headway PWM32 Photo Resist Spinner
  • Karl Suss MJB-3 Mask Aligner
  • ABM Mask Aligner
  • Raith50 SEM &Ebeam
  • Raith e_LiNE Electron-beam Lithography and Nanoengineering Workstation
• Deposition Systems
• Packaging Systems and Integration
• Characterization Systems